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Application of chemical vapor generation in ICP-MS: A review
Authors:Ying Gao  Rui Liu  Lu Yang
Institution:15751. Chengdu University of Technology, Chengdu, 610059, China
25751. Chemical Metrology, National Research Council Canada, Ottawa, Ontario, K1A 0R6, Canada
Abstract:Chemical vapor generation (CVG) is an important sample introduction technique, and is widely used for atomic spectrometry for its enhanced sensitivity and selectivity. In the past 30 years, inductively coupled plasma mass spectrometry (ICP-MS) has become a widely used and the most sensitive instrument for (ultra-)trace element determination and elemental speciation. A review of applications of this state-of-the-art coupling of CVG and ICP-MS is presented. Discussion is focused on its applications for both element determination and speciation, including hydride generation, cold vapor generation, photochemical vapor generation, alkylation, and electrochemical vapor generation. In addition, recent studies undertaken isotope dilution calibration in CVG-ICP-MS for achieving improved accuracy and precision are summarized, and the future perspectives are discussed.
Keywords:
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