| YAG基片的机械抛光研究 |
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| 引用本文： | 鲁德初.YAG基片的机械抛光研究[J].孝感学院学报,2006,26(6):43-45. |
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| 作者姓名： | 鲁德初 |
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| 作者单位： | 孝感学院,物理与电子信息工程学院,湖北,孝感,432000 |
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| 摘 要： | 通过对机械抛光后的YAG表面进行了研究,结果表明:合理优化工艺参数,可获得较好的面形和较低的粗糙度,影响抛光效率的因素为磨粒、正压力和转速。采用较大粒度的磨粒,合理的增加压力和转速,有利于提高抛光效率。
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| 关 键 词： | YAG 机械抛光 抛光效率 |
| 文章编号： | 1671-2544（2006）06-0043-03 |
| 收稿时间： | 2006-07-21 |
| 修稿时间： | 2006-07-21 |
Research on the Mechanical Polishing for YAG Pieces |
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| LU De-chu.Research on the Mechanical Polishing for YAG Pieces[J].JOURNAL OF XIAOGAN UNIVERSITY,2006,26(6):43-45. |
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| Authors: | LU De-chu |
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| Institution: | School of Physics and Electronic-informatlon Engineering, Xiaogan University, Xiaogan, Hubei 432000, China |
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| Abstract: | This paper studied the YAG pieces which had been mechanically polished.The result indicated that there were several factors that influence the polishing efficiency,including grind granule,positive pressure and rotate speed.The proper pressure and speed are beneficial to improving polishing efficiency for bigger grind granule. |
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| Keywords: | YAG mechanical polishing polishing efficiency |
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