SED平板显示薄膜电极的工艺研究

表面传导电子显示（SED）的关键部分是下基板（即阴极板）的制作,而阴极板上薄膜电极的质量直接影响了阴极电子发射的性能。本文研究了采用剥离技术来制备SED平板显示器阴极板上薄膜电极的工艺,实验表明,利用剥离工艺所镀制的铬铜铬金属薄膜厚度为123.93nm,电极条的平均阻值为12.26Ω,通过显微镜放大1000倍可以看到电极裂缝宽度为10μm,阵列精细整齐,无翘边、连线情况出现,并且附着力、热稳定性和厚度性能也达到了后续工艺的要求。

Research on Fabrication Technology of Thin Film Electrod in SED Flat Panel Display

Cathode panel plays a key role on the surface conduction electron emission display.And the thin film electrode in cathode plate directly affects the quality of the cathode electron emission performance.The study indicated that the process of the lift-off techniques applied in the fabrication of the thin film electrode .The result shows that the thickness of the chromium - copper -chromium metal film is 123.93nm , the average resistance of the one arrange of electrode is 12.26Ω, the electrode space width is 10pμm and the electrode is fine and neat without connectivity. By testing we found that the adhesion, thermal stability and thickness of the thin film electrode totally achieve the following preccss＇s requirements.