磨粒和抛光垫对铝合金化学机械抛光性能

磨粒和抛光垫为化学机械抛光(CMP)提供了重要的机械磨削作用。为了探讨磨粒和抛光垫对铝合金化学机械抛光的磨削作用,研究了不同种类磨粒和抛光垫对材料去除率和表面形貌的影响。结果表明：在pH=12-13时,氧化铝抛光液去除率(MRR)为910nm/min,远大于二氧化硅与氧化铈抛光液,且获得较为理想光滑表面。3种不同抛光垫抛光后的铝合金表面,呢子抛光垫表面将不会出现划痕与腐蚀点,表面粗糙度较低为10.9nm。随着氧化铝浓度的增加,材料去除率(MRR)和表面粗糙度(Ra)均增加。当氧化铝含量为4wt%时,抛光垫使用呢子抛光垫适宜铝合金化学机械抛光,在获得高去除率的同时铝合金表面精度高。

Effects of Pad Surface Micro-Texture and Abrasive Particles on the Surface Characteristics When Chemical Mechanical Polishing Aluminum Alloys

This study investigated the effect of different pad surface and abrasive particles on the tribological attributes during aluminum alloys chemical mechanical polishing(CMP).A series of experiments were conducted to study the effects of different pad surface and abrasive particles on surface roughness (Ra) as well as material removal rate (MRR).The particles were Al2O3, SiO2 and CeO2.It is found that the use of Al2O3 polishing solution can obtain better polishing effect(MRR=910nm/min) when polishing slurry pH=12-13.The pads were polyurethane pad with porous surface, woolen and synthetic leather pad.The aluminum alloys surface polished by the synthetic leather pad is smooth wthout any damage. The roughness of the polished surface caused by the synthetic leather pad is about 10.9nm.With the Al2O3 particle content increased, the material removal rate and surface roughness increased.When the weight fraction of Al2O3 particle reached 4%(weight fraction) and the synthetic leather pad used,the minimum Ra and highest MRR can be achieved.