等离子体增强化学气相沉积法制备类金刚石薄膜研究综述

类金刚石薄膜由于其独特的物理化学特性，使得该薄膜在光学、电学、机械、医学、航空航天等领域得到了广泛应用。等离子体增强化学气相沉积(plasma enhanced chemical vapor deposition, PECVD)制备类金刚石是近几十年兴起的新的制备类金刚石薄膜的方法，因其对沉积温度要求低，对基底友好，同时还具有沉积速率快和无转移生长的优势，获得了越来越多的研究者关注。详细介绍了类金刚石薄膜优异的特性，阐述了在等离子化学气相沉积条件下，不同沉积条件对沉积类金刚石薄膜结构特性的影响。衬底的选择直接影响着沉积类金刚石薄膜的性能，不同的衬底直接决定着生成类金刚石结构中sp³相的数量和质量；沉积参数是最为常见的控制条件，对沉积薄膜的总体效果影响也是最大的，改变沉积参数，沉积薄膜的表面将会变得更加光滑致密；常用的掺杂元素是硅和氮，掺杂元素的引入往往是为了降低沉积薄膜的内应力，提高与衬底间的结合力，延长使用寿命等；由于很难直接在金属上沉积类金刚石薄膜，所以常通过制备复合层来改善沉积效果。最后对类金刚石薄膜的发展以及今后研究方向进行了展望。

A review of the preparation of diamond-like films by PECVD method

First, the advantages of diamond-like carbon coatings were introduced in detail, and then the different advantages of diamond-like carbon films prepared under different control conditions were expounded. There were many factors affecting the performance of diamond-like carbon films. The choice of substrate directly affects the properties of the deposited diamond-like carbon film. Since the four-fold coordination of silicon was the same as the structure of diamond carbon, and silicon can stabilize the stable existence of the sp3 phase in the diamond-like structure. The difference of deposition conditions was the most common control condition, and it also had the greatest influence on the overall effect of the deposited film. For example, by introducing an appropriate proportion of inert gas into the deposition gas, the surface of the deposited film will become smoother and denser. The commonly used doped elements were silicon and nitrogen. The introduction of doping elements was often to reduce the internal stress of the deposited film, improve the bonding force with the substrate, and prolong the service life. Since there were few options for depositing diamond-like carbon directly on the metal and obtaining better results, the preparation of composite layer was often used to improve the deposition effect. Finally, the development of diamond-like carbon films and future research directions were prospected.