| 磁控溅射薄膜的厚度均匀性理论研究 |
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| 引用本文： | 胡作启,李佐宜,缪向水,刘卫忠.磁控溅射薄膜的厚度均匀性理论研究[J].华中科技大学学报(自然科学版),1996(1). |
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| 作者姓名： | 胡作启 李佐宜 缪向水 刘卫忠 |
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| 作者单位： | 华中理工大学固体电子学系 |
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| 摘 要： | 建立了一个磁控溅射模型，在几种特殊情况下，给出了计算机模拟的薄膜厚度三维分布和二维分布，提出了制备大面积薄膜的条件．结果表明：计算机模拟的结果与实验结果和有关文献的结果一致．
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| 关 键 词： | 磁控溅射 薄膜厚度 磁场 模型 |
On the Thickness Uniformity of Films Deposited by Magnetron Sputtering |
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| Hu Zuoqi, Li Zucyi,Miao Xiangshui, Liu Weizhong.On the Thickness Uniformity of Films Deposited by Magnetron Sputtering[J].JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE,1996(1). |
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| Authors: | Hu Zuoqi Li Zucyi Miao Xiangshui Liu Weizhong |
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| Institution: | Hu Zuoqi; Li Zucyi;Miao Xiangshui; Liu Weizhong |
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| Abstract: | A magnetron sputtering model is developed by taking the distribution of magnetron magnetic field into consideration.In a few special cases,the relative thickness distribution in three dimensions and two dimensions of the deposited films are given by mathematical integration.The methods of depositing the films of a large area are proposed.It is shown that the results of computer simulation are in agreement with those of experiments and published literature. |
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| Keywords: | s: magnetron sputtering film thickness magnetic field model |
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