| 半导体器件工作温度的光学干涉测量 |
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| 引用本文： | 李丽华,鲁强.半导体器件工作温度的光学干涉测量[J].华中科技大学学报(自然科学版),1997(6). |
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| 作者姓名： | 李丽华 鲁强 |
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| 作者单位： | 华中理工大学光电子工程系 |
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| 摘 要： | 采用光学干涉测温原理测量微电子器件在线工作温度，设计了干涉测温系统，进行了实际测量实验，并与红外微像仪的测量结果进行了比较．
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| 关 键 词： | 功率器件 温度测量 干涉测温 |
Measurement of the Working Temperature of Semiconductor Devices with Optic
Interferometry |
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| Li Lihua Dept. of Photoelectronic Eng.,HUST,Wuhan ,China. Lu
Qiang.Measurement of the Working Temperature of Semiconductor Devices with Optic
Interferometry[J].JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE,1997(6). |
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| Authors: | Li Lihua Dept of Photoelectronic Eng HUST Wuhan China Lu
Qiang |
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| Institution: | Li Lihua Dept. of Photoelectronic Eng.,HUST,Wuhan 430074,China. Lu
Qiang |
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| Abstract: | The drawbacks of conventional thermal measuring techniques are discussed
and thermometry based on the principle of optic interferometry is proposed for on line
measurement of the working temperature of the power semiconductor device. A practical system
has been designed and a comparison between the experimental results obtained by the method
developed and those with IR micro imager shows that the method of the authors has the
advantages of high resolution, non intrusiveness and a wide measuring range. |
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| Keywords: | power devices temperature measurement interferometric thermometry |
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