| 基于透反式二维绝对零位光栅的光刻对准技术 |
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| 引用本文： | 叶锡标,周成刚,张阳,黄文浩.基于透反式二维绝对零位光栅的光刻对准技术[J].中国科学技术大学学报,2007,37(3):264-267. |
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| 作者姓名： | 叶锡标 周成刚 张阳 黄文浩 |
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| 作者单位： | 中国科学技术大学精密机械与精密仪器系,安徽合肥,230026 |
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| 基金项目： | 高等学校博士学科点专项科研项目 |
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| 摘 要： | 在二维零位光栅原理的基础上提出了一种透反式二维零位光栅系统,从理论上分析了系统的可行性,并进行了对准性能的试验.实验数据表明透反式光栅系统比一般的光刻对准技术的对比度更强,判别零位的性能更好.该系统作为一种新型的掩模-硅片对准技术,应用于光刻机中可获得优于20 nm的定位对准精度.
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| 关 键 词： | 透反式二维零位光栅 光刻对准技术 光强信号对比度 对准精度 |
| 文章编号： | 0253-2778(2007)03-0264-04 |
| 修稿时间： | 09 29 2006 12:00AM |
Lithography alignment technology based on two-dimensional zero reference grating by transmission-reflection |
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| YE Xi-biao,ZHOU Cheng-gang,ZHANG Yang,HUANG Wen-hao.Lithography alignment technology based on two-dimensional zero reference grating by transmission-reflection[J].Journal of University of Science and Technology of China,2007,37(3):264-267. |
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| Authors: | YE Xi-biao ZHOU Cheng-gang ZHANG Yang HUANG Wen-hao |
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| Institution: | Department of Precision Machinery and Instrumentation, University of Science and Technology of China, Hefei 230026, China |
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| Abstract: | A two-dimensional zero reference grating by transmission-reflection based on the theory of two-dimensional zero reference grating was proposed.Its feasibility was analyzed in theory and its alignment capability was verified in experiments.The data obtained from the experiments demonstrate that the two-dimensional zero reference grating by transmission-reflection provides better contrast and distinguishing zero point capability than does the normal lithography alignment technology.As a new alignment technology between mask and silicon wafer,the technology can offer a better than 20 nm alignment precision repeat used in lithography systems. |
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| Keywords: | two-dimensional zero reference grating by transmission-reflection lithography alignment technology contrast of the light signal intensity alignment precision |
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