| 氧压对用PLD法制备的ZnO薄膜的特性影响 |
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| 引用本文： | 魏显起,张铭杨,满宝元.氧压对用PLD法制备的ZnO薄膜的特性影响[J].济南大学学报(自然科学版),2009,23(4):376-379. |
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| 作者姓名： | 魏显起 张铭杨 满宝元 |
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| 作者单位： | 1. 济南大学,理学院,山东,济南,250022
2. 山东师范大学,物理与电子科学学院,山东,济南,250014 |
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| 基金项目： | 山东省自然科学基金，国家自然科学基金 |
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| 摘 要： | 通过脉冲激光沉积方法在不同的氧压中制备ZnO 薄膜.用X射线衍射(XRD)谱、原子力显微镜(AFM)及光学透过率谱表征了薄膜的结构和光学特性.XRD谱和AFM显示在生长压力为2Pa时获得了较好的结晶薄膜,随着氧压的提升薄膜表面平整,晶粒均匀.光学透过率谱显示在生长压力为5Pa时有较好的光学特性.
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| 关 键 词： | ZnO薄膜 晶体结构 表面形貌 光学特性 |
Effect of O_2 Pressure on the Property of ZnO Thin Films Fabricated by PLD |
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| WEI Xian-qi,ZHANG Ming-yang,MAN Bao-yuan.Effect of O_2 Pressure on the Property of ZnO Thin Films Fabricated by PLD[J].Journal of Jinan University(Science & Technology),2009,23(4):376-379. |
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| Authors: | WEI Xian-qi ZHANG Ming-yang MAN Bao-yuan |
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| Institution: | 1.School of Science;University of Jinan;Jinan 250022;China;2.College of Physics and Electronics;Shandong Normal University;Jinan 250014;China |
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| Abstract: | ZnO thin films were grown at various O2 pressure by pulsed-laser deposition.The structure and optical properties of ZnO thin films were investigated by X-ray diffraction(XRD),atomic force microscopy(AFM) and optical transmittance spectra.XRD and AFM results show that the crystal quality is perfect for the ZnO film grown at a pressure of 2Pa,and with increasing O2 pressure thin films have even surfaces and crystal grains.Optical transmittance spectra show that the ZnO film possesses good optical property at ... |
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| Keywords: | PLD |
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