| 组合式金合金圆平面磁控靶的设计 |
| |
| 引用本文： | 程树英,郑文汀,施金凿.组合式金合金圆平面磁控靶的设计[J].福州大学学报(自然科学版),1998(4):35-37. |
| |
| 作者姓名： | 程树英 郑文汀 施金凿 |
| |
| 作者单位： | 福州大学电子科学与应用物理系 |
| |
| 摘 要： | 首先对传统的圆平面磁控靶的形状进行改进，设计一个靶材利用率高的纯金靶．利用金合金的色区图，计算沉积不同Ｋ值和颜色的镀金膜时，组合式Ｋ金靶上金、银、铜的面积比，从而在纯金靶上固定相应面积的扇形银片和铜片，研制出不同Ｋ值和色度的组合式金合金靶．
|
| 关 键 词： | 磁控溅射 圆平面靶 K金 沉积 |
The Design of a Combined Circular Plane Magnetron Sputtering Gold Alloy Target |
| |
| Cheng Shuying,Zheng Wenting,Shi Jinzao.The Design of a Combined Circular Plane Magnetron Sputtering Gold Alloy Target[J].Journal of Fuzhou University(Natural Science Edition),1998(4):35-37. |
| |
| Authors: | Cheng Shuying Zheng Wenting Shi Jinzao |
| |
| Institution: | Cheng Shuying Zheng Wenting Shi Jinzao (Department of Electronic Science and Applied Physics, Fuzhou University, Fuzhou, 350002) |
| |
| Abstract: | Firstly according to the basic principle of magnetron sputtering, a toroidal pure gold plan target was designed. Then on the basic of the color chart of gold alloys, a combined gold alloy target was designed which consists of different area ratios of Au, Ag, Cu. With the target all kinds of K-gold thin films can be deposited. The target making processes will make good use of the gold and make great progress in vaccum magnetron sputtering gold film technology. |
| |
| Keywords: | magnetron sputtering circular plane target K-gold deposition |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《福州大学学报(自然科学版)》浏览原始摘要信息 |
| 点击此处可从《福州大学学报(自然科学版)》下载免费的PDF全文 |
