| 基体/介质/金属双层薄膜内应力的研究 |
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| 引用本文： | 于映,陈跃.基体/介质/金属双层薄膜内应力的研究[J].福州大学学报(自然科学版),2001,29(1):20-21. |
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| 作者姓名： | 于映 陈跃 |
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| 作者单位： | 福州大学电子科学与应用物理系, |
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| 基金项目： | 福建省自然科学基金!资助项目 (E9810 0 0 4) |
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| 摘 要： | 采用PECVD法和磁控溅射法在 40Cr钢基片上分别沉积氮化硅薄膜和NiCr合金膜 ,用钠光平面干涉法测量双层薄膜的内应力 ,并具体分析该双层薄膜的内应力与薄膜厚度及系统之间的关系 .
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| 关 键 词： | 双层薄膜 平面干涉法 内应力 |
| 文章编号： | 1000-2243(2001)01-0020-02 |
| 修稿时间： | 2000年1月24日 |
A study on internal stress of dielectric and metal double-layer thin films |
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| YU Ying,CHEN Yue.A study on internal stress of dielectric and metal double-layer thin films[J].Journal of Fuzhou University(Natural Science Edition),2001,29(1):20-21. |
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| Authors: | YU Ying CHEN Yue |
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| Institution: | (Department of Electronic Science and Applied Physics, Fuzhou University, Fuzhou, Fujian 350002, China) |
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| Abstract: | The silicon nitride dielectric thin film and NiCr alloy thin film were prepared by PECVD and sputtering methods. The internal stress of the double-layer thin films were measured by using laser beam planar interference and the relationship between stress, thickness and the two-layer system were analysed. |
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| Keywords: | double-layer thin film internal stress laser beam planar interference |
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