| 场致发射材料的特性 |
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| 引用本文： | 林志贤,郭太良.场致发射材料的特性[J].福州大学学报(自然科学版),2000,28(4):22-25. |
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| 作者姓名： | 林志贤 郭太良 |
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| 作者单位： | 福州大学电子科学与应用物理系,福建,福州,350002 |
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| 基金项目： | 福建省自然科学基金资助项目!(F96024) |
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| 摘 要： | 主要论述了场致发射材料及其特性 ,对金属、硅微尖、金刚石薄膜、GaAs等的制备工艺和阴极特性作了较为详细的分析 .介绍了这些材料在新型场致发射显示器件 (FED)、真空微电子管作为阴极材料的应用 ,并对场致发射材料的获得和改进进行了初步的探讨
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| 关 键 词： | 场致发射材料 阴极 制备工艺 特性 |
| 修稿时间： | 1999-11-02 |
The characteristics of field emission materials |
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| LIN Zhi-xian,GUO Tai-liang.The characteristics of field emission materials[J].Journal of Fuzhou University(Natural Science Edition),2000,28(4):22-25. |
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| Authors: | LIN Zhi-xian GUO Tai-liang |
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| Institution: | (Department of Electronic Science and Applied Physics, Fuzhou University,Fuzhou,Fujian 350002,China) |
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| Abstract: | In this paper some field emission materials and their characteristics are discussed. These materials include metals, silicon tips, diamond-films, GaAs etc. Their fabrication technology and cathode characteristics are analyzed in detail. Then we introduce the application of these materials in a new type FED and as cathodes in vacuum micro-electronic tubes. Finally, in summarizing some experience, we discuss the obtainment and improvement of field emission materials. |
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| Keywords: | field emission material cathode fabrication technology characteristics |
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