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钨等离子体电子密度的研究
引用本文:肖培,姜明,周平,吴双.钨等离子体电子密度的研究[J].四川师范大学学报(自然科学版),2012,35(4):534-538.
作者姓名:肖培  姜明  周平  吴双
作者单位:1. 西南民族大学电气信息工程学院,四川成都,610041
2. 四川师范大学数学与软件科学学院,四川成都,610066
基金项目:国家自然科学基金,国家外专局2010年度外国文教专家重点项目
摘    要:用SHML模型计算了温度从0.3 keV到10.0 keV、密度从0.001 g/cm3到0.1 g/cm3的钨等离子体的电子密度,研究了钨等离子体电子密度随温度、密度的变化规律.计算结果表明,钨的电子密度随等离子体的温度、密度增加而增大,并且出现了3次缓慢变化的平台.分析了平台出现的原因,特别是温度从6.5 keV到10.0 keV时出现的平台,是由于等离子体的温度太高,导致钨原子中的电子几乎全部电离所致.因此,选用钨元素作为聚变堆第一壁材料时,应尽量避免高Z钨进入氘、氚等离子体中,从而破坏聚变反应.

关 键 词:钨等离子体  电子密度  聚变堆第一壁

Study on the Electron Density of Wu Plasma
XIAO Pei , JIANG Ming , ZHOU Ping , WU Shuang.Study on the Electron Density of Wu Plasma[J].Journal of Sichuan Normal University(Natural Science),2012,35(4):534-538.
Authors:XIAO Pei  JIANG Ming  ZHOU Ping  WU Shuang
Institution:1(1.College of Electrical Information Engineering,Southwest University for Nationalities,Chengdu 610041,Sichuan; 2.College of Mathematics and Software Science,Sichuan Normal University,Chengdu 610066,Sichuan)
Abstract:The electron density about Wu plasma is calculated by SHML model with temperatures in the range of 0.3 keV to 10 keV and density in the range of 0.001 g/cm3 to 0.1 g/cm3 to investigate the variation of Wu electron density in different temperature and density.The results show that electron density of Wu plasma increases as the raise at temperature and the density,involving three plateau steps in graph.The reason for the formation of these plateau steps is analyzed,especially for the plateau in the temperature range from 6.5 keV to 10.0 keV,Wu electrons almost totally are ionized due to the high temperature of plasma.Therefore,if tungsten is selected as the first wall materials of fusion reactor,it is important to avoid the fusion reaction being destroyed by preventing high Z tungsten into deuterium and tritium plasma.
Keywords:Wu plasma  electron density  fusion first wall
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