氧化多孔硅和纳米硅粒镶嵌氧化硅光致发光机制模型

关于纳米硅／氧化硅系统的光致发光(PL)机制，有很多争议．该系统包括氧化多孔硅(PS)和用化学气相沉积、溅射或硅离子注入氧化硅等方法形成的纳米硅粒(NSP)镶嵌氧化硅．提出二种PL竞争机制：量子限制(QC)过程和量子限制-发光中心(QCLC)过程．两个过程中光激发都发生在NSP中，光发射在QC过程是发生在NSP中，而在QCLC过程是发生在与NSP相邻的氧化硅中的发光中心上．对两种过程的几率大小进行比较．哪一过程对PL起主要作用，取决于俘获截面、发光效率、发光中心密度和NSP的尺寸．对于一个有固定的俘获截面、发光效率和LC密度的纳米硅／氧化硅系统，LC密度越高，NSP尺寸越大，越有利于QCLC过程超过QC过程，反之亦然．对于固定的发光中心参数，NSP尺寸有一个临界值，当NSP的最可几尺寸大于临界值，QCLC2过程主导发光，当NSP的最可几尺寸小于临界值时，QC过程主导发光，当NSP大小接近临界值时，Qc与QCLC都要考虑在内．利用这个模型讨论了一些已报导的纳米硅／氧化硅系统PL的实验结果．

Photoluminescence Mechanism Model for Oxidized Porous Silicon and Nanoscale-silicon- particle-embedded Silicon Oxide

There is much debate about the photoluminescence (PL) mechanisms of the nanoscale Si/Si oxide systems containing oxidized porous silicon and a nanoscale-Si-particle (NSP)-embedded Si oxide deposited by chemical vapor deposition, sputtering, or Si-ion implanting into Si oxide. In this paper, we suggest that two competitive processes, namely, the quantum confinement (QC) process and the quantum confinement-luminescence center (QCLC) process, take place in the PL. The photoexcitation occurs in the NSPs for both processes, while the photoemission occurs either in the NSPs for the QC process or in the luminescence centers (LCs) in Si oxide adjacent to the NSPs for the QCLC process. The rates of both processes are compared quantitatively. Which process plays the major role in PL is determined by the capture cross section, the luminescence efficiency, and the density of the LCs, and the sizes of the NSPs. For a nanoscale Si/Si oxide system with the LCs having certain capture cross-section and luminescence efficiency, the higher the LC density and the larger the sizes of NSPs, the more beneficial for the QCLC process to surpass the QC process, and vice versa. For certain LC parameters, there is a critical most probable size for the NSPs. When the most probable size of the NSPs is larger than the critical one, the QCLC process dominates the PL, and when the most probable size of the NSPs is smaller than the critical one, the QC process dominates the PL. When the most probable size of the NSPs is close to the critical one, both the QC and QCLC processes should be taken into account. We have used this model to discuss PL experimental results reported for some nanoscale Si/Si oxide systems.