首页 | 本学科首页   官方微博 | 高级检索  
     检索      

Cu衬底上ZnO纳米结构及其光催化性能分析
引用本文:段金霞,涂宽,敖志光.Cu衬底上ZnO纳米结构及其光催化性能分析[J].孝感师专学报,2014(3):68-72.
作者姓名:段金霞  涂宽  敖志光
作者单位:湖北大学物理与电子科学学院,湖北武汉430062
基金项目:国家级大学生创新创业训练项目(201210512014);国家自然科学青年基金(11204070);湖北省教育厅青年基金项目(Q20120106)
摘    要:采用两步电化学沉积法在Cu衬底上沉积得到ZnO纳米结构薄膜。用X-射线衍射(XRD)和扫描电子显微镜(SEM)对其结构及形貌进行表征,发现先在Cu衬底上沉积一层Zn致密膜,更有利于在其表面上得到附着力强、形貌较好的ZnO纳米结构膜。系统考察了沉积温度和沉积时间等工艺参数对ZnO纳米结构的影响。结果表明,沉积温度和沉积时间对晶体结构和形貌有显著影响,通过对工艺进行适宜控制可以得到结晶性良好的六方纤锌矿型ZnO纳米结构膜。以罗丹明B为目标有机污染物,分析了ZnO膜的光催化性能,表明所制备的ZnO膜可以作为光催化剂,其光催化效率可达到72.4%。

关 键 词:电化学沉积  ZnO薄膜  光催化  罗丹明B

Analysis of ZnO Nanostructures on Cu Substrate and Photocatalytic Performance
Duan Jinxia,Tu Kuan,Ao Zhiguang.Analysis of ZnO Nanostructures on Cu Substrate and Photocatalytic Performance[J].Journal of Xiaogan University,2014(3):68-72.
Authors:Duan Jinxia  Tu Kuan  Ao Zhiguang
Institution:(Faculty of Physics and Electronic Science, Hubei University, Wuhan , Hubei 430062, China)
Abstract:ZnO nanostructure films are obtained on Cu substrate by using a two-step electrochemical deposition technique.The structures and morphologies are characterized by X-ray diffraction(XRD)and scanning electron microscopy(SEM).It is shown that Zn compact films pre-deposited on the Cu substrate are beneficial to the growth of ZnO nanostructure films.In addition,a systematical investigation is made for the effects of the deposition temperature and time on the morphologies of the ZnO films.The results show that the deposition temperature and time have obvious impact on the morphologies of the ZnO nanostructures,and that highly-crystalline ZnO films with hexagonal wurtzite structure can be obtained through suitable process conditions.Rhodamine B is used as the target organic pollutants to explore the photocatalytic performance,indicating that the prepared ZnO films can be used as a photocatalyst whose photocatalytic efficiency is as high as 72.4%.
Keywords:electrochemical deposition  ZnO thin film  photocatalysis  Rhodamine B
本文献已被 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号