| 电沉积壳聚糖-镝复合涂层缓蚀性的研究 |
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| 引用本文： | 陈敏,肖亚平,杜涛,任乔林,覃彩芹,李伟.电沉积壳聚糖-镝复合涂层缓蚀性的研究[J].孝感师专学报,2013(6):20-23. |
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| 作者姓名： | 陈敏 肖亚平 杜涛 任乔林 覃彩芹 李伟 |
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| 作者单位： | [1]孝感供电公司检修公司,湖北孝感432000 [2]湖北工程学院,湖北孝感432000 |
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| 基金项目： | 湖北省电力公司2013年科技项目（2001） |
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| 摘 要： | 以壳聚糖和镝为原料,利用电沉积技术在铜片上形成新型的壳聚糖-镝复合涂层.涂层的耐腐蚀性采用电子扫描显微镜（SEM）、X射线能谱（EDS）、动电位极化测量（TAFEL曲线）和电化学交流阻抗（EIS）进行研究.试验结果表明,在电压为5V,沉积时间为5min,溶液pH=3.8的室温条件下可以在铜表面形成稳定、均匀的壳聚糖-镝复合涂层,该涂层能够显著提高铜片在酸性体系中的缓蚀性.
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| 关 键 词： | 壳聚糖 镝 电沉积 |
Study of Stability and Corrosion Inhibition of Electrophoretic Deposited Chitosan-dysprosium on Copper |
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| Chen Min Xiao Yaping Du Tao Ren Qiaolin Qin Caiqin Li Wei.Study of Stability and Corrosion Inhibition of Electrophoretic Deposited Chitosan-dysprosium on Copper[J].Journal of Xiaogan University,2013(6):20-23. |
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| Authors: | Chen Min Xiao Yaping Du Tao Ren Qiaolin Qin Caiqin Li Wei |
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| Institution: | Chen Min Xiao Yaping Du Tao Ren Qiaolin Qin Caiqin Li Wei (1. Maintenance Company of Xiaogan Power Supply, Xiaogan, Hubei 432000, China ; 2. School of Chemistry and Material Science, Hubei Engineering University ,Xiaogan, Hubei 432000, China) |
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| Abstract: | The electrophoretic deposition （EPD） of chitosan （CS） and dysprosium on copper substrates was done in the experiment. The stability and corrosion inhibition of the new kind of chitosan-dyspro- sium coating on copper was investigated by scanning electron microscopy （SEM）, energy dispersion spectrum（EDS）, potentiodynamic polarization measurements （TAFEL）, and electrochemical imped- ance spectroscopy （EIS）. Results indicated that stable and uniform coating on copper surface could be formed at the voltage of 5V, the deposition time of 5min, solution pH=3.8 and room temperature. The coating could significantly improve the corrosion inhibition of copper in scid system. |
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| Keywords: | chitosan dysprosium electrodeposition |
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