| 介质分界面电荷积聚过程分析 |
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| 引用本文： | 汪沨,肖登明,陈庆国,邱毓昌.介质分界面电荷积聚过程分析[J].西安交通大学学报,2001,34(4):347-350,369. |
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| 作者姓名： | 汪沨 肖登明 陈庆国 邱毓昌 |
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| 作者单位： | 西安交通大学 |
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| 基金项目： | 高等学校重点实验室访问学者基金资助项目． |
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| 摘 要： | 建立了电压与绝缘子表面电荷分布的动态方程，分析了直流电压作用下表面电荷的积聚过程，并给出了绝缘子表面电荷动态分布的近似表达式。研究表明，以往文献中给出的平板电极结构介质分界面处的表面电荷积聚方程只是文中方程的一个特例。引入了具有长度量纲的电压／场强比例系数，并在此基础上计算了3种典型电极算例的表面电荷分布，理论计算结果与以往文献的实验结果基本吻合。
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| 关 键 词： | 绝缘子 表面电荷 电荷积聚 气体绝缘 动态分布 直流电压 介质分界面 |
| 文章编号： | 0253－987X(2001)04-0347-04 |
Analysis of Charge Accumulation at Dielectric Interface |
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| Wang Feng,Xiao Dengming,Chen Qingguo,Qiu Yuchang.Analysis of Charge Accumulation at Dielectric Interface[J].Journal of Xi'an Jiaotong University,2001,34(4):347-350,369. |
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| Authors: | Wang Feng Xiao Dengming Chen Qingguo Qiu Yuchang |
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| Abstract: | The dynamic equation describing the relationship between surface charge density and voltage is established. The constants of voltage/field strength A and B are introduced. Based on the present equation, the constants A, B and the surface charge density of three typical electrodes are calculated. The dynamic process of surface charging is analyzed, and the approximate expression for the dynamic charge distribution is also presented. The result is supported by measurements reported in some previous investigations. |
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| Keywords: | insulator surface charge charge accumulation |
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