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The Effect of Discharge Power on the 02/TICl4 Plasma Deposition of TiO2 Atmospheric Pressure Non-equilibrium Ar/ Film
Authors:WANG De-xin  YANG Qin-yu  GUO Ying  DING Ke  ZHANG Jing
Institution:[1]State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Material Science and Engineering, Donghua University, Shanghai 201620, China [2]College of Science, Donghua University, Shanghai201620, China
Abstract:
Keywords:atmospheric pressure non-equilibrium Ar/ O2/ TiCl4 plasma  TiO2  discharge power
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