| 用HF-醇溶液法制备多孔硅的新方法 |
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| 引用本文： | 李晓天,刘明登,王兢,刘国范.用HF-醇溶液法制备多孔硅的新方法[J].吉林大学学报(理学版),1993(1). |
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| 作者姓名： | 李晓天 刘明登 王兢 刘国范 |
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| 作者单位： | 吉林大学电子科学系，吉林大学电子科学系，吉林大学电子科学系，吉林大学电子科学系 长春 130023，长春 130023，长春 130023，长春 130023 |
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| 摘 要： | 本文采用HF-醇溶液法制备了多孔硅.实验表明,它提高了多孔硅中的游离氟离子浓度,改善了电解液与硅片的润湿性,有利于形成均匀的多孔硅;在非光照条件下,可制成N型多孔硅.
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| 关 键 词： | HF-醇溶液法 多孔硅 孔隙率 |
A New Method for Preparing Porous Silicon Layer in Propyl Alcohol Hydrofluoric Acid Solution by Anodization |
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| Li Xiaotian,Liu Mingdeng,Wang Jing,Liu Guofan.A New Method for Preparing Porous Silicon Layer in Propyl Alcohol Hydrofluoric Acid Solution by Anodization[J].Journal of Jilin University: Sci Ed,1993(1). |
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| Authors: | Li Xiaotian Liu Mingdeng Wang Jing Liu Guofan |
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| Abstract: | The anodization of silicon in propyl alcohol hydrofluoric acid solution has been studied for preparing porous silicon. In this solution, the concentration of the free fluorine ion is increased. The perfect contact between the silicon surface and the electrolyte is obtained, and uniform porous silicon layer is formated more easily in this solution than in aqueous hydrofluoric acid. Moreover, the porous silicon can be prepared from n-type silicon in this electrolyte without illumination. |
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| Keywords: | hydroflouric acid solution porous silicon porosity |
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