| 电解质溶液浓度对铜/硫醇自组装膜缓蚀行为的影响 |
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| 引用本文： | 崔维真,丁克强,霍莉,王庆飞,童汝亭.电解质溶液浓度对铜/硫醇自组装膜缓蚀行为的影响[J].河北师范大学学报(自然科学版),2003,27(2):160-162. |
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| 作者姓名： | 崔维真 丁克强 霍莉 王庆飞 童汝亭 |
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| 作者单位： | 1. 沧州师范专科学校,化学系,河北,沧州,061001;河北师范大学,化学学院,河北,石家庄,050016
2. 河北师范大学,化学学院,河北,石家庄,050016 |
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| 基金项目： | 国家自然科学基金资助项目 ( 2 99730 2 6 ) |
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| 摘 要： | 采用交流阻抗法首次研究了在不同浓度的NaCl和HCl溶液中十八－硫醇自组装置对铜电极的缓蚀行为。实验结果表明随NaCl和HCl溶液浓度的增加，十八－硫醇自组装膜对铜电极的缓蚀能力降低。
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| 关 键 词： | 电解质溶液 铜缓蚀剂 十八－硫醇 自组装膜 交流阻抗法 缓蚀能力 腐蚀保护 |
| 文章编号： | 1000-5854(2003)02-0160-03 |
The Effect of the Electrolytic Solution Concentration on the Corrosion Protection of ODT SAM for Copper |
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| CUI Wei-zhen ,DING Ke-qiang,HUO Li,WANG Qing-fei,TONG Ru-ting.The Effect of the Electrolytic Solution Concentration on the Corrosion Protection of ODT SAM for Copper[J].Journal of Hebei Normal University,2003,27(2):160-162. |
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| Authors: | CUI Wei-zhen DING Ke-qiang HUO Li WANG Qing-fei TONG Ru-ting |
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| Institution: | CUI Wei-zhen 1,2,DING Ke-qiang2,HUO Li2,WANG Qing-fei2,TONG Ru-ting2 |
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| Abstract: | The corrosion protection behavior of the ODT self-assembled monolayer(SAM) modified the copper electrode have been investigated for the first time. The effects of the both of the NaCl and HCl solution on the corrosion protection of ODT SAM were considered, and the results shown that the corrosion efficiency of ODT decrease with the increasing of NaCl and HCl concentration,which is meaningful not only to detect the corrosion mechanism but also to develop the novel copper corrosion inhibitor. |
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| Keywords: | corrosion inhibitor of copper n-octadecanethiol(ODT) self-assembled monolayer AC impedance spectroscopy |
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