等离子体显示器中MgO介质保护膜结构和放电性能研究

为了研究等离子体显示器(PDP)中MgO介质保护膜的结构及其放电特性,通过电子束蒸发沉积,在不同的基板温度和沉积速率下获得MgO介质保护膜,并利用X射线衍射分析及放电试验对其进行了研究.试验结果表明:虽然各工艺下的MgO薄膜都只有(111)择优取向,但结构存在差异.少数工艺下得到的MgO的(111)衍射峰的晶面间距变化很小,衍射峰强度较高,同时可获得最低的着火电压-132.2 V;而在其它的基板温度和沉积速率下的MgO薄膜发生晶格畸变,(111)的晶面间距有1%以上的收缩,相应的衍射峰强度也低,而着火电压均高于140 V.另外,较高的基板温度和沉积速率易导致MgO薄膜的晶格畸变.

Study on Structure and Discharge Characteristics of MgO Films in Plasma Display Panel

The MgO dielectric protective films, used in plasma display panel (PDP) and grown by electron beam evaporation at different substrate temperature and deposition rate, are studied with X-ray diffraction (XRD) and firing-voltage test in this paper. The results show that the (111) preferential orientation is always observed in MgO films at all substrate temperature and deposition rates, which presents two kinds of structure with different crystal-plane spacing, i.e. one with a crystal-plane spacing approximate to the conventional polycrystalline MgO and another with 1% shrinkage rate of crystal-plane spacing compared to the conventional polycrystalline MgO. The former is observed to have a stronger (111) peak and a lower firing voltage than the latter in which the lattice distortion occurs. It is also show that the higher substrate temperature and deposition rate tend to form (111) with larger shrinkage of crystal panel spacing.