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| 热催化PCVD法高速沉积a-Si:H膜 | |
| 引用本文： | 林揆训 林璇英. 热催化PCVD法高速沉积a-Si:H膜[J]. 汕头大学学报(自然科学版), 1990, 5(1): 43-47 |
| 作者姓名： | 林揆训 林璇英 |
| 摘 要： | 非晶硅薄膜的高速沉积是非晶硅太阳电池低成本,大规模生产和推广应用的关键技术之一.我们采用预热反应气体.在小的射频功率流密度条件下.用热催化等离子体化学气相沉积方法.获得了沉积速率为20×10~(-10)m/s光敏性达10~5的优质非晶硅薄膜. |
| 关 键 词： | 沉积速率 热催化PCVD 光敏性 |
High Rate Deposition of a-Si: H Film by Using the Thermocatalytic PCVD Method |
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| Lin Kuixum Lin Xuanying. High Rate Deposition of a-Si: H Film by Using the Thermocatalytic PCVD Method[J]. Journal of Shantou University(Natural Science Edition), 1990, 5(1): 43-47 | |
| Authors: | Lin Kuixum Lin Xuanying |
| Affiliation: | Lin Kuixum Lin Xuanying |
| Abstract: | High rate deposition of α-Si: H films is one of the key techniques for low-cost and large-scale production and wide popularization and applicattion of α-Si:H solar cells. We have obtained high-quality α-Si:H films with a deposition rate of up to 20×10~(-10)m/s and a photosensitivity of up to 10~5 by using the thermocatalytic PCVD method for preheating the reacting gases at low radiofrequenoy power flow density. |
| Keywords: | Deposition rate Thermocatalytic PCVD Photosensitivity |
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