| 气氛和温度对AlON透明陶瓷热腐蚀的影响 |
| |
| 引用本文： | 于健,卢铁城,齐建起,温雅,王海平,文劲松,阳志林,王跃忠,肖磊,喻寅,魏念.气氛和温度对AlON透明陶瓷热腐蚀的影响[J].四川大学学报(自然科学版),2010,47(3):615-618. |
| |
| 作者姓名： | 于健 卢铁城 齐建起 温雅 王海平 文劲松 阳志林 王跃忠 肖磊 喻寅 魏念 |
| |
| 作者单位： | 1. 四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064
2. 四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064;中科院国际材料物理中心,沈阳,110015 |
| |
| 摘 要： | 以氧化钇为烧结助剂,在流动氮气气氛下,经1880 ℃保温10小时获得AlON陶瓷.将所得到的陶瓷样品研磨抛光后分别在氮气(常压)气氛下1750 ℃,1680 ℃,1650 ℃和真空(<1.0×10-3 Pa)气氛下1680 ℃,1650 ℃进行热腐蚀.保温时间均为2小时.然后将上述经热腐蚀后的各样品用扫描电子显微镜对其腐蚀表面进行了观察,进而研究气氛和温度对AlON陶瓷热腐蚀的影响.通过对以上结果的分析比较得到AlON热腐蚀的最佳条件为真空(<1.0×10-3 Pa)条件下1650 ℃.最后对新生晶粒组成成份、产生的原因以及温度对陶瓷表面腐蚀程度的影响也进行了分析.
|
| 关 键 词： | 氮氧化铝陶瓷 气氛 温度 热腐蚀 |
| 收稿时间： | 8/6/2009 12:00:00 AM |
The influence of temperature and atmosphere on the thermal etching of AlON |
| |
| YU Jian,LU Tie-Cheng,QI Jian-Qi,WEN Ya,WANG Hai-Ping,WEN Jin-Song,YANG Zhi-Lin,WANG Yue-Zhong,XIAO Lei,YU Yin,WEI Nian.The influence of temperature and atmosphere on the thermal etching of AlON[J].Journal of Sichuan University (Natural Science Edition),2010,47(3):615-618. |
| |
| Authors: | YU Jian LU Tie-Cheng QI Jian-Qi WEN Ya WANG Hai-Ping WEN Jin-Song YANG Zhi-Lin WANG Yue-Zhong XIAO Lei YU Yin WEI Nian |
| |
| Institution: | Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University; International Center for Material Physics, Chinese Academy of Sciences;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University;Department of Physics & Key Laboratory for Radiation Physics and Technology of Ministry of Education,Sichuan University |
| |
| Abstract: | |
| |
| Keywords: | AlON atmosphere temperature thermal etching |
| 本文献已被 万方数据 等数据库收录！ |
| 点击此处可从《四川大学学报(自然科学版)》浏览原始摘要信息 |
| 点击此处可从《四川大学学报(自然科学版)》下载免费的PDF全文 |
|
