| 压强和温度对薄膜折射率的影响模型 |
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| 引用本文： | 张大伟,孙浩杰,吕玮阁.压强和温度对薄膜折射率的影响模型[J].上海理工大学学报,2007,29(2):175-178. |
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| 作者姓名： | 张大伟 孙浩杰 吕玮阁 |
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| 作者单位： | 1. 上海理工大学,光学与电子信息工程学院,上海,200093
2. 上海市嘉定区疁城实验学校,上海,201800 |
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| 基金项目： | 上海市重点学科建设项目;上海市高校优秀青年教师后备人选科研项目 |
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| 摘 要： | 基于膜分子和气相分子在沉积时竞争的观点,得到压强和温度对薄膜折射率影响的理论模型.模型的研究表明,薄膜折射率随真空压强的增加而降低;并随沉积温度的增加而增加.在不同真空压强和不同沉积温度下制备了氧化锆薄膜,计算了样品的折射率,结果显示的规律和理论模型的规律基本一致.
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| 关 键 词： | 压强 温度 薄膜沉积 折射率 |
| 文章编号： | 1007-6735（2007）02-0175-04 |
| 修稿时间： | 2006-04-19 |
Effects of pressure and temperature on the refraction of film |
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| ZHANG Da-wei,SUN Hao-jie,L.Effects of pressure and temperature on the refraction of film[J].Journal of University of Shanghai For Science and Technology,2007,29(2):175-178. |
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| Authors: | ZHANG Da-wei SUN Hao-jie L |
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| Institution: | 1. College of Optical and Electronic Information Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China ; 2. Jiadiny Loucheng Shiyan School, Shanghai 201800, China |
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| Abstract: | From the viewpoint of molecular competition,a theoretical model was developed to investigate the effect of vacuum and temperature on the film refraction.It shows that with the increase of vacuum pressure the refractive index decreases,and with the increase of temperature the refractive index increases.Some ZrO2 films were deposited in different vacuum pressures and temperatures and the samples refraction indices were calculated.The results show that the experimental data are basically consistent with that from the model. |
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| Keywords: | pressure temperature thin film deposition refractive index |
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