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化学气相沉积金刚石膜的硬度
引用本文:唐才先,罗廷礼,张永贵,臧建民,潘存海,石尔平,吕反修,唐伟中,钟国仿,M.Samandi.化学气相沉积金刚石膜的硬度[J].河北省科学院学报,1999,16(4):34-36,41.
作者姓名:唐才先  罗廷礼  张永贵  臧建民  潘存海  石尔平  吕反修  唐伟中  钟国仿  M.Samandi
作者单位:1. 河北省机电一体化中试基地,石家庄,050081
2. 北京科技大学,北京,100083
3. Materials Engineering Department,University of Wollongong,NSW2500 Australia
摘    要:使用力驱动静态超微压痕测量仪器(Force Driven Static Measuring Ultra Micro- Inden-tation System )- UMIS- 2000 对由直流等离子体喷射法沉积的金刚石膜进行测量。结果显示金刚石膜的硬度不仅与晶体生长方向和晶粒大小有关,还与厚度有关。生长面和与基底接触面的金刚石膜硬度也有区别。后者被认为由于随机取向的微小晶粒占优势,其硬度比生长面略高。在所进行的测量中,硬度值在90GPa左右。

关 键 词:CVD金刚石膜  硬度  超微压痕测量法

Hardness of chemical vaper deposition diamond film
TANG Cai-xian,LUO Ting-li,ZHANG Yong-gui,ZONG Jian-min,PAN Cun-Hai,SHI Er-ping,LU Fan-xiu,TANG Wei-zhong,ZHONG Gou-Fang,M.Samandi.Hardness of chemical vaper deposition diamond film[J].Journal of The Hebei Academy of Sciences,1999,16(4):34-36,41.
Authors:TANG Cai-xian  LUO Ting-li  ZHANG Yong-gui  ZONG Jian-min  PAN Cun-Hai  SHI Er-ping  LU Fan-xiu  TANG Wei-zhong  ZHONG Gou-Fang  MSamandi
Abstract:Diamond film produced DC arc plasma jet is measured by force driven static measuring ultra micr indentation system UMIS 2000.The result shows that hardness of diamond film is related to not only crystal growth direction but also thickness.The right side of diamond film also differs from the reverse side in hardness.The hardness of the reverse side is harder than the right side,because it have an advantage in small crystal of random direction.Among the measures,the hardness value is 90GPa or so.
Keywords:CVD diamond film  Hardness  Ultr micro  indentation measuring means
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