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填充因子的变化对束半径影响的模拟研究
引用本文:余海军,翁甲强,陈德坤,刘萍,成丽春.填充因子的变化对束半径影响的模拟研究[J].广西师范大学学报(自然科学版),2006,24(2):15-18.
作者姓名:余海军  翁甲强  陈德坤  刘萍  成丽春
作者单位:1. 广西师范大学,物理与电子工程学院,广西,桂林,541004
2. 茂名学院,物理系,广东,茂名,525320
3. 上海交通大学,物理系,上海,200000
4. 桂林电子工业学院,七系,广西,桂林,541004
基金项目:国家高技术研究发展计划(863计划)
摘    要:研究了在以对数函数控制器进行束晕控制的条件下,填充因子的变化对强流离子加速器中初始分布为K-V分布的离子束半径的影响,通过将其与延迟反馈控制器下所得的结果进行比较,发现在相当大的填充因子取值范围内,使用对数函数控制器时,束半径的变化比使用延迟反馈控制器时小,而且在以离子数比为控制变量的对数函数控制下,束最大半径和均方根半径也没有像使用延迟反馈控制器那样有明显的峰值或波谷出现。

关 键 词:填充因子  K-V分布  离子数比  对数函数控制器  相对发散度
文章编号:1001-6600(2006)02-0015-04
收稿时间:2005-12-19
修稿时间:2005年12月19

Simulation Investigation Effect on Beam Radius by Change of Filling Factor
YU Hai-jun,WENG Jia-qiang,CHEN De-kun,LIU Ping,CHENG Li-chun.Simulation Investigation Effect on Beam Radius by Change of Filling Factor[J].Journal of Guangxi Normal University(Natural Science Edition),2006,24(2):15-18.
Authors:YU Hai-jun  WENG Jia-qiang  CHEN De-kun  LIU Ping  CHENG Li-chun
Institution:1. College of Physics and Electronic Engineering, Guangxi Normal University, Guilin 541004, China; 2. Department of Physics, Maoming University,Maoming 525320,China; 3. Department of Physics, Shanghai Jiaotong University,Shanghai 200000, China; 4. Department of Seventh, Guilin Electronic Indust ties Academy, Guilin 541004, China
Abstract:The effect on the beam radius due to the change of the filling factor for K-V distribution was studied under logarithm-function controller and was compared with the result of the delayed feedback controller.By numerical simulation,it was found that the change of the beam radius under logarithm-function controller was smaller than the delayed feedback controller's in a quite large range of filling factor.In addition,the beam radius did not apparently have peak value or trough under logarithm-function controller by selecing ion numbers ratio as controlling variable,which was not like the results that had the peak value of the maximal radius and the trough of the root-mean-square radius under the delayed feedback controller.
Keywords:filling factor  K-V distribution  ion numbers ratio  logarithm-function controller  relatively emittance
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