Corrosion resistance properties and preparation of α-C3N4 thin films

Well adhered C₃N₄ films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) on industrial pure iron substrates using ternary Si−N−C films as buffer layer. XRD measurement showed that the C₃N₄ films belong to the α-C₃N₄ phase. Electrochemical experiments showed that the corrosive resistance of the pure iron raised by two orders of magnitude after being covered with the α-C₃N₄ coating. Foundation item: Supported by the National Natural Science Foundation of China(19875037) Biography: ZHANG Wei(1975-), male, Graduate student. Research direction: thin film.