| 靶衬间距对脉冲激光沉积薄膜均匀性的影响 |
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| 引用本文： | 王成伟,马军满,陈建彪.靶衬间距对脉冲激光沉积薄膜均匀性的影响[J].西北师范大学学报,2010,46(3):39-43. |
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| 作者姓名： | 王成伟 马军满 陈建彪 |
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| 作者单位： | 王成伟,WANG Cheng-wei(西北师范大学物理与电子工程学院,甘肃兰州,730070;西北师范大学极端环境原子分子物理实验室,甘肃兰州,730070);马军满,陈建彪,MA Jun-man,CHEN Jian-biao(西北师范大学物理与电子工程学院,甘肃兰州,730070) |
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| 基金项目： | 国家自然科学基金，甘肃省自然科学基金，甘肃省高等学校研究生导师科研项目，西北师范大学科技创新工程项目 |
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| 摘 要： | 以国产脉冲激光沉积设备(PLD-Ⅲ型)在玻璃衬底上沉积Ti O2薄膜为例,研究了PLD法制膜过程中靶衬间距对薄膜均匀性的影响.实验过程中,以Ti O2陶瓷片作为靶材,玻璃作为衬底,保持其他工艺条件(如单脉冲能量、脉冲频率、沉积脉冲总数、衬底温度等)不变,专门考察了不同靶衬间距下,Ti O2薄膜在整个衬底台平面区域的沉积分布状况.结果表明,按样品的表观灰度划分,薄膜沉积的相对均匀区可分为2～3个轴对称区域,分别对应不同的沉积速率和厚度;在一定范围内调节靶衬间距(3.00～7.00 cm),可使高速率沉积区逐渐由轴对称的圆环状变为中心大圆斑(直径约2.20 cm).结合PLD沉积原理与靶衬之间的几何关系,分析了导致上述结果的机理.
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| 关 键 词： | 脉冲激光沉积(PLD) 靶衬间距 均匀性 |
The effect of target-to-substrate distance on the uniformity of thin films prepared by pulse laser deposition |
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| WANG Cheng-wei,MA Jun-man,CHEN Jian-biao.The effect of target-to-substrate distance on the uniformity of thin films prepared by pulse laser deposition[J].Journal of Northwest Normal University Natural Science (Bimonthly),2010,46(3):39-43. |
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| Authors: | WANG Cheng-wei MA Jun-man CHEN Jian-biao |
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| Institution: | WANG Cheng-wei1,2,MA Jun-man1,CHEN Jian-biao1(1.College of Physics , Electronic Engineering,Northwest Normal University,Lanzhou 730070,Gansu,China,2.Joint Laboratory of Atomic , Molecular Physics,NWNU & IMP CAS,China) |
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| Abstract: | The effect of target-to-substrate distance on the uniformity of films prepared by pulse laser deposition(PLD)is investigated,which takes TiO2 films deposited on glass substrates as an example.In deposition process,selecting TiO2 ceramic as target and common glass as substrate,and keeping other technical parameters(such as pulse energy,pulse frequency,substrate temperature,pulse counts,etc.)with same condition,the distribution of TiO2 films on the whole substrate holder is investigated with different target-... |
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| Keywords: | pulse laser deposition(PLD) target-to-substrate distance uniformity |
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