| 光刻图形转移技术 |
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| 引用本文： | 张永平,程越,卢吴越,谈嘉慧,赵高杰,刘益宏,孙玉俊,陈之战,石旺舟,李万荣,陆逸枫. 光刻图形转移技术[J]. 上海师范大学学报(自然科学版), 2014, 43(2): 132-136 |
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| 作者姓名： | 张永平 程越 卢吴越 谈嘉慧 赵高杰 刘益宏 孙玉俊 陈之战 石旺舟 李万荣 陆逸枫 |
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| 作者单位： | 上海师范大学数理学院,上海,200234 |
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| 基金项目： | 973计划预研专项，上海市科委创新项目 |
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| 摘 要： | 通过对预烘、光刻胶旋涂、软烘焙、对准曝光、后烘、显影、坚膜的光刻工艺过程分析,主要介绍了光刻工艺中容易出现的问题及解决方法,并通过实验和分析得出了可靠的技术方案.
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| 关 键 词： | 光刻 光刻工艺 光刻胶 |
| 收稿时间： | 2014-01-03 |
Research on photolithography graphic pattern transfer technology |
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| ZHANG Yongping,CHENG Yue,LU Wuyue,TAN Jiahui,ZHAO Gaojie,LIU Yihong,SUN Yujun,CHEN Zhizhan,SHI Wangzhou,LI Wanrong and LU Yifeng. Research on photolithography graphic pattern transfer technology[J]. Journal of Shanghai Normal University(Natural Sciences), 2014, 43(2): 132-136 |
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| Authors: | ZHANG Yongping CHENG Yue LU Wuyue TAN Jiahui ZHAO Gaojie LIU Yihong SUN Yujun CHEN Zhizhan SHI Wangzhou LI Wanrong LU Yifeng |
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| Affiliation: | ZHANG Yongping;CHENG Yue;LU Wuyue;TAN Jiahui;ZHAO Gaojie;LIU Yihong;SUN Yujun;CHEN Zhizhan;SHI Wangzhou;LI Wanrong;LU Yifeng;College of Mathematics and Sciences,Shanghai Normal University; |
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| Abstract: | The process of the photolithography were introduced in this paper,including pre-baking,the photoresist coating,soft baking,alignment and exposure,post-exposure baking,development,hard baking. Then we mainly discussed the problems in the photolithography process and the solutions of these problems. We did large number of experiments,and the results were carefully analyzed. Finally,reliable and stable solutions were provided via analyzis and experiments. |
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| Keywords: | photolithography photolithography technique photoresist |
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