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射频PECVD方法生长含氢非晶碳膜的结构及摩擦学性能
引用本文:李明,蔺增,王凤,巴德纯.射频PECVD方法生长含氢非晶碳膜的结构及摩擦学性能[J].东北大学学报(自然科学版),2007,28(12):1745-1748.
作者姓名:李明  蔺增  王凤  巴德纯
作者单位:东北大学,机械工程与自动化学院,辽宁,沈阳,110004
基金项目:辽宁省自然科学基金资助项目(20062029),华中科技大学塑性成形模拟及模具技术国家重点实验室开放基金资助项目(06-9)
摘    要:利用射频等离子体增强化学气相沉积技术在不锈钢表面制备了含氢非晶碳膜.采用Raman光谱、红外光谱、X射线光电子能谱和原子力显微镜等研究了薄膜的微观结构和表面形貌,在栓盘摩擦磨损试验机上考察了薄膜在不同载荷与滑动速度下的摩擦学性能.结果表明:所制备的含氢非晶碳膜具有典型的类金刚石结构特征,薄膜均匀、致密,表面粗糙度小;薄膜与不锈钢球对磨时显示出良好的抗磨减摩性能;薄膜的抗磨减摩性能同对磨件表面上形成的转移膜以及摩擦过程中薄膜结构的石墨化相关.

关 键 词:射频等离子体增强化学气相沉积  含氢非晶碳膜  结构  摩擦学性能  
文章编号:1005-3026(2007)12-1745-04
修稿时间:2007年7月22日

Structure and Tribological Properties of a-C:H Films Deposited by RF PECVD
LI Ming,LIN Zeng,WANG Feng,BA De-chun.Structure and Tribological Properties of a-C:H Films Deposited by RF PECVD[J].Journal of Northeastern University(Natural Science),2007,28(12):1745-1748.
Authors:LI Ming  LIN Zeng  WANG Feng  BA De-chun
Institution:(1) School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110004, China
Abstract:The hydrogenated amorphous carbon(a-C:H) thin films were successfully deposited on stainless steel substrate by radio frequency plasma enhanced chemical vapor deposition(RF PECVD).The microstructure and morphology of the film were investigated by means of Raman spectroscopy,X-ray photoelectron spectroscopy,infrared spectrometry and atomic force microscopy.The friction and wear behavior of the film sliding against a stainless steel ball under different loads and at different velocities were examined on a pin-on-disc tester.It was found that the film prepared by RF PECVD has typical hydrogenated diamond-like characteristics and is very smooth and compact,and it shows good friction-reducing and wearable behavior when sliding against a stainless steel ball.The results also revealed that the films wearability is in relation to the graphite transfer film formed on the worn surface and the graphitization of the film in tribological process.
Keywords:radio frequency plasma enhanced chemical vapor deposition(RF PECVD)  hydrogenated amorphous carbon film  structure  tribological properties
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