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低温高速双极晶体管基区的优化设计
引用本文:魏同立,沈克强.低温高速双极晶体管基区的优化设计[J].东南大学学报(自然科学版),1995,25(3):34-38.
作者姓名:魏同立  沈克强
作者单位:东南大学微电子中心
摘    要:本文考虑禁带变窄效应和载流子冻析效应,分析了基区掺杂浓度的分布、基区峰值浓度的大小及位置对基区渡越时间的影响,结合基区电阻的温度模型,对低温度高速双极晶体管的优化设计作了探讨。

关 键 词:低温  基区电阻  双极晶体管  优化设计

Optimizing the Base Profile for High-SpeedBipolar Transistore at Low Temperature
Li Yao, Wei Tongli,Shen Keqiang.Optimizing the Base Profile for High-SpeedBipolar Transistore at Low Temperature[J].Journal of Southeast University(Natural Science Edition),1995,25(3):34-38.
Authors:Li Yao  Wei Tongli  Shen Keqiang
Abstract:The influences of the distribution of the base doping concentration, the magnitude and thelocaton of the base peak concentration on base transit time are studied by consideruig bandgap-narrow-ing effects and carrier freeze-out effects. Including a base resistance model dependent of temperature,optimuni design of the base of hish-spoed bipolar transistors at low temperatures is investigated.
Keywords:low temperature  high-speed  optimization / base transit time  base resistance  
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