热处理对ITO薄膜光电性能和抗蚀刻性的影响

利用不同的热处理温度对磁控溅射在玻璃基底的ITO薄膜进行退火处理.借助于原子力显微镜(AFM)、分光辐射计、四探针电阻测试仪等测试手段对不同热处理后的ITO薄膜样品进行表征,研究了不同热处理温度对ITO薄膜表面形貌、面电阻、透光率及抗刻蚀性能的影响.结果表明,随着退火温度的升高,ITO薄膜表面粗糙度增加,面电阻增大,在可见光区的透光率变大,耐刻蚀性增强.

Influences of heat treatment on optical and electrical properties and etching resistance of ITO films

In this paper,ITO films deposited on the glass substrates by magnetron sputtering technology were annealed in different annealing temperatures.The heat treatment effects on electrical and optical properties of ITO films under different annealing temperatures were studied using atomic force microscopy(AFM),four-probe instrument and spectoradiometer.It showed that the morphology of ITO films surface is significantly changed by the heat treatment and the sheet resistance,transmission in the visible light and etching resistance obviously increases with increasing of annealing temperature in air.