| 不同工况下薄膜生长结构的计算机模拟 |
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| 引用本文： | 李梦轲 王成伟. 不同工况下薄膜生长结构的计算机模拟[J]. 西北师范大学学报(自然科学版), 1997, 33(2): 31-33 |
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| 作者姓名： | 李梦轲 王成伟 |
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| 作者单位： | 西北师范大学物理系 |
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| 摘 要： | 用蒙特卡罗方法，在计算机上模拟了不同工况下薄膜的生长结构，证明了阴影效应和沉积原子的有限迁移是导致柱状结构的原因．采用离子束辅助沉积工艺，可提高膜层聚集密度，消除柱状结构
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| 关 键 词： | 薄膜 沉积 计算机模拟 |
Computer simulation of thin films growing microstructure in different conditions |
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| Li Mengke Wang Chengwei. Computer simulation of thin films growing microstructure in different conditions[J]. Journal of Northwest Normal University Natural Science (Bimonthly), 1997, 33(2): 31-33 |
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| Authors: | Li Mengke Wang Chengwei |
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| Abstract: | The microstructure of growing thin films in different conditions are simulated with Monte Carlo method by computer.It is demonstrated that shadowing effect and limited mobility of the deposited atoms are the main reason for the formation of the columnar microstructure .It can increase the packing density and decrease the columnar microstructure of thin films with IAD technology. |
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| Keywords: | thin filmsdepositioncomputer simulation |
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