首页 | 本学科首页   官方微博 | 高级检索  
     检索      

用点渲染算法实现光刻胶显影过程的三维模拟
引用本文:崔滨,万旺根,吴永亮,金龙存,杨晓东.用点渲染算法实现光刻胶显影过程的三维模拟[J].应用科学学报,2009,27(4):375-380.
作者姓名:崔滨  万旺根  吴永亮  金龙存  杨晓东
作者单位:上海大学通信与信息工程学院,上海200072
基金项目:国家自然科学基金,国家高技术研究发展计划(863计划),the Shanghai's Key Discipline Development Program,In novation Foundation for Graduate Student of Shangahai University 
摘    要:用顶点和面片三维显示光刻胶显影模拟结果的方法不支持海量数据. 为此提出基于层次结构的三维场景绘制点渲染算法,并引入网格插值法填补显影模拟中在光刻胶表面出现的空洞,用Dill算法、Kim模型和介质光线算法建立光刻显影模型. 实验结果表明,该方法能高效、精确、实时地绘制光刻显影模型输出的大规模海量数据.

关 键 词:点渲染  光刻显影  层次细节结构  
收稿时间:2008-09-01
修稿时间:2009-02-25

Simulation of Point Based Rendering for Three Dimensional Lithography Development
CUI Bin,WAN Wang-gen,WU Yong-liang,JIN Long-cun,YANG Xiao-dong.Simulation of Point Based Rendering for Three Dimensional Lithography Development[J].Journal of Applied Sciences,2009,27(4):375-380.
Authors:CUI Bin  WAN Wang-gen  WU Yong-liang  JIN Long-cun  YANG Xiao-dong
Institution:School of Communication and Information Engineering, Shanghai University, Shanghai 200072, China
Abstract:Simulation results are presented with vertices and polygons which did not adequately support display of complex scenes of point-cloud data when using traditional methods. Thus we use a hierarchical point-based representation algorithm for rendering, and introduce a mesh-interpolation algorithm to fill the gaps in the advance of the surface. Meanwhile, a model for lithography development based on the Dill algorithm, the Kim model and the ray algorithm is established. Experimental results show that the hierarchical point-based rendering algorithm is effective for the real-time realization of large-scale 3D visualization.
Keywords:point based rendering  lithography development  level of detail hierarchy
本文献已被 万方数据 等数据库收录!
点击此处可从《应用科学学报》浏览原始摘要信息
点击此处可从《应用科学学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号