| 脉冲激光烧蚀沉积纳米Si膜动力学研究现状 |
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| 引用本文： | 张荣梅,王英龙.脉冲激光烧蚀沉积纳米Si膜动力学研究现状[J].河北大学学报(自然科学版),2003,23(3):329-333. |
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| 作者姓名： | 张荣梅 王英龙 |
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| 作者单位： | 河北大学,物理科学与技术学院,河北,保定,071002 |
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| 基金项目： | 河北省自然科学基金资助项目 (5 0 0 0 84 ) |
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| 摘 要： | Si基纳米材料在半导体光电集成领域有着十分诱人的前景,脉冲激光烧蚀技术是目前材料界和分析界最有前景的技术之一.介绍了脉冲激光烧蚀沉积Si基纳米材料的基本原理,从实验和理论方面对其动力学研究现状进行了综述.
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| 关 键 词： | 激光烧蚀 沉积 动力学 |
| 文章编号： | 1000-1565(2003)03-0329-05 |
| 修稿时间： | 2003年3月8日 |
Progress of Dynamic Study for Silicon Nanoparticales Deposited by Pulsed Laser Ablation |
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| ZHANG Rong_mei,WANG Ying_long.Progress of Dynamic Study for Silicon Nanoparticales Deposited by Pulsed Laser Ablation[J].Journal of Hebei University (Natural Science Edition),2003,23(3):329-333. |
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| Authors: | ZHANG Rong_mei WANG Ying_long |
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| Abstract: | Nanostructrured Si_based materials have wide prospect in the semiconductor opto_electronic integration field.Pulse laser ablation is one of the most important developed technique in recent years with its applications in material and analytical fields. The fundamental theory of Silicon nanoparticales deposited by pulse laser ablation was introduced and its dynamic study in recent years was systematically reviewed from theory and experiment. |
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| Keywords: | laser ablation deposition dynamics |
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