| 电弧离子镀(Ti,Cr)N硬质薄膜的成分、结构与硬度 |
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| 引用本文： | 陈军,林国强,陈静,韦江,王富岗.电弧离子镀(Ti,Cr)N硬质薄膜的成分、结构与硬度[J].大连理工大学学报,2002,42(5):555-559. |
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| 作者姓名： | 陈军 林国强 陈静 韦江 王富岗 |
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| 作者单位： | 1. 大连理工大学,三束材料改性国家重点实验室,辽宁,大连,116024
2. 大连机车车辆厂,辽宁,大连,116012 |
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| 基金项目： | 国家自然科学基金资助项目 (5 0 0 710 17) |
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| 摘 要： | 用Bulat6型电弧离子镀设备在高速钢表面沉积合成(Ti,Cr)N硬质薄膜。通过改变分离靶弧电流的配置来调节薄膜成分，制取了x=0.62-0.83的（TixCr1-x)N薄膜；考察了薄膜的成分、结构与硬度间的相互关系，明确了Cr在TiN基薄膜中使硬度提高的合金强化作用；结合元素周期律中的基本性质和热力学特征，讨论了Ti,Cr两种元素在（Ti,Cr)N薄膜的相结构（fcc)形成与合金强化中的作用。
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| 关 键 词： | （Ti Cr）N硬质薄膜 硬度 合金强化 薄膜成分 电弧离子镀 氮化钛铬 薄膜相结构 合成 |
| 文章编号： | 1000-8608(2002)05-0555-05 |
Composition, structure and hardness of (Ti,Cr)N films deposited by arc ion plating |
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| CHEN Jun ,LIN Guo qiang ,CHEN Jing ,WEI Jiang ,WANG Fu gang.Composition, structure and hardness of (Ti,Cr)N films deposited by arc ion plating[J].Journal of Dalian University of Technology,2002,42(5):555-559. |
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| Authors: | CHEN Jun LIN Guo qiang CHEN Jing WEI Jiang WANG Fu gang |
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| Institution: | CHEN Jun 1,LIN Guo qiang 1,CHEN Jing 2,WEI Jiang 2,WANG Fu gang 1 |
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| Abstract: | Ti,Cr)N hard films were deposited on the surface of high speed steel with Bulat6 arc ion plating source. Ti x Cr 1-x N films in which x varied from 0.62 to 0.83 were obtained by adjusting cathodic currents of the two separated targets. The interrelationship among the film hardness, the composition and the structure was analyzed. The alloy strengthening effect of the element Cr on TiN based hard films is discussed. The influences of Ti and Cr on the formation of phase structure (fcc) and alloy enhancement in (Ti,Cr)N films are also discussed according to their physical properties of element periodicity and thermodynamic characteristics. |
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| Keywords: | alloy strengthening/hard film arc ion plating chromium nitride |
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