用化学刻蚀技术研究热致性液晶聚合物的微结构(英文)

浓硫酸被发展用于刻蚀主链热致性液晶共聚芳酯B-N的条带织构,它对该液晶聚合物的向列织构有良好的选择性。用SEM和TEM揭示了微纤形态。特别是非平面构象、B-ET用高锰酸钾刻蚀也观察到微纤的条带织构。对微纤转弯处的优先刻蚀现象用PET富集解释。

MORPHOLOGY STUDIES OF THERMOTROPIC LIQUID CRYSTALLINE POLYMERS USING CHEMICAL ETCHING TECHNIQUES

Concentrated sulphuric acid was developed to etch the banded texture of thermotropic main chain liquid crystalline copolyester B-N, showing excellent selectivity for this nematic texture. SEM and TEM were used to reveal the fibril morphology, expecially the out-of-plane comformation. Another copolyester B-ET was treated by permanganic etches, also demonstrating the fibrillar banded texture. The dominant attack in bent regions of fibrils was explained by PET richening.