| 铜膜厚度对铜膜结构和光电学性质的影响 |
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| 引用本文： | 肖荣辉,郑卫峰,郑明志,彭福川,赖发春. 铜膜厚度对铜膜结构和光电学性质的影响[J]. 福建师范大学学报(自然科学版), 2010, 26(6) |
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| 作者姓名： | 肖荣辉 郑卫峰 郑明志 彭福川 赖发春 |
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| 作者单位： | 1. 三明学院物理与机电工程系,福建,三明,365004;福建师范大学物理与光电信息科技学院,福建,福州,350108
2. 福建师范大学物理与光电信息科技学院,福建,福州,350108 |
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| 基金项目： | 福建省自然科学基金资助项目(2007J0317); 福建省教育厅资助项目(JA08048) |
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| 摘 要： | 采用热蒸发方法在玻璃基片上沉积100 nm以内不同厚度的铜薄膜.利用X射线衍射仪、原子力显微镜和分光光度计分别检测薄膜的结构、表面形貌和光学性质,用Van der Pauw方法测量薄膜的电学性质.结果表明,可以将薄膜按厚度划分为区(0~11.5 nm)的岛状膜、区(11.5~32 nm)的网状膜和区(32.0 nm)的连续膜.薄膜的表面粗糙度随膜厚的增加,在、区时增加,区时减小.薄膜电阻在区时无法测量,在区随膜厚的增加急剧下降,而在区时随膜厚增加缓慢减小.薄膜的光学吸收与其表面粗糙度密切相关,其变化规律与表面粗糙度的变化相一致.
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| 关 键 词： | 铜薄膜 膜厚 结构 光学性质 电学性质 |
Influence of Thickness on the Structural,Optical and Electrical Properties of Cu Films |
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| XIAO Rong-hui,ZHENG Wei-feng,ZHENG Ming-zhi,PENG Fu-chuan,LAI Fa-chun. Influence of Thickness on the Structural,Optical and Electrical Properties of Cu Films[J]. Journal of Fujian Teachers University(Natural Science), 2010, 26(6) |
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| Authors: | XIAO Rong-hui ZHENG Wei-feng ZHENG Ming-zhi PENG Fu-chuan LAI Fa-chun |
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| Affiliation: | XIAO Rong-hui1,2,ZHENG Wei-feng2,ZHENG Ming-zhi2,PENG Fu-chuan2,LAI Fa-chun2(1.Department of Physics,Mechanical and Electric engineering,Sanming University,Sanming 365004,China,2.School of Physics and OptoElectronics Technology,Fujian Normal University,Fuzhou 350108,China) |
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| Abstract: | Cu films with different thicknesses(d,d<100 nm) were deposited on glass substrates by thermal evaporation.The structure,surface morphology,optical and electrical properties of the films were investigated by X-ray diffractometer,atomic force microscopy and Van der Pauw method,respectively.The films can be divided into three regions,which are island,mesh and continuous film.The thicknesses of three regions are between 0 and 11.5 nm,between 11.5 and 32.0 nm and larger than 32.0 nm respectively.In the first reg... |
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| Keywords: | Cu films film thickness structure optical properties electrical properties |
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