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氩离子辅助轰击对激光烧蚀法制备非晶碳膜的影响
引用本文:郭建,杨益民.氩离子辅助轰击对激光烧蚀法制备非晶碳膜的影响[J].湘潭大学自然科学学报,2002,24(2):97-100.
作者姓名:郭建  杨益民
作者单位:湘潭大学物理系,湖南,湘潭,411105
基金项目:湖南省教育厅资助项目 ( 980 0 2B)
摘    要:离子辅助轰击能有效改善非晶碳 (a -C)膜的质量 .用脉冲激光 ( 5 32nm ,3.5× 10 8W cm2 )烧蚀石墨靶 ,同时用Ar+轰击膜面 ,在Si( 10 0 )衬底上沉积a -C膜 .用扫描电镜和喇曼光谱对膜结构作了分析 .结果表明 :在较低气压和较高的射频功率下制备的a -C膜质量较好 ,同时 ,激光重复频率对膜生长也有显著影响

关 键 词:  离子辅助轰击  激光烧蚀法  非晶碳膜

Influence of Argon Ion-assisted Bombardment on Amorphous Carbon Film Deposited by Laser Ablation
GUO Jian,YANG Yimin.Influence of Argon Ion-assisted Bombardment on Amorphous Carbon Film Deposited by Laser Ablation[J].Natural Science Journal of Xiangtan University,2002,24(2):97-100.
Authors:GUO Jian  YANG Yimin
Abstract:Ion-assisted bombardment is an effective method to improve a-C film. A-C films were deposited on Si (100) by pulse laser (532 nm, 3.5 10 8W/cm 2) ablating graphite target with Ar + bombarding growing films simultaneously. Scanning electrical microscope and Raman spectra were applied to analysis film s structure. As a result, lower working pressure and higher RF power is helpful to prepare good a-C film, meanwhile, laser repetition has evident influence on film s growth.
Keywords:Ion-assisted bombardment  Amorphous carbon  Laser ablation
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