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IMPLICIT—EXPLICIT MULTISTEP FINITE ELEMENT METHODS FOR THE SEMICONDUCTOR DEVICE PROBLEM
引用本文:CHENWei. IMPLICIT—EXPLICIT MULTISTEP FINITE ELEMENT METHODS FOR THE SEMICONDUCTOR DEVICE PROBLEM[J]. 系统科学与复杂性, 2003, 16(1): 101-103
作者姓名:CHENWei
作者单位:DepartmentofEconomics,ShandongUniversity,Jinan250100,AcademyofMathematicsandSystemsScience,ChineseAca
基金项目:This research is supported by China Postdoctoral Science Foundation.
摘    要:The transient behavior of a semiconductor device consists of a Poisson equation for the electric potential and of two nonlinear parabolic equations for the electron density and hole density.The electric potential equation is discretized by the finite element method.The electron and hole density equations are treated by implicit-explicit multistep finite element methods.The optimal L^2-norm error estimates are derived.

关 键 词:半导体 有限元方法 泊松方程 非线性抛物方程 电位 电荷密度

IMPLICIT-EXPLICIT MULTISTEP FINITE ELEMENT METHODS FOR THE SEMICONDUCTOR DEVICEPROBLEM
CHEN Wei. IMPLICIT-EXPLICIT MULTISTEP FINITE ELEMENT METHODS FOR THE SEMICONDUCTOR DEVICEPROBLEM[J]. Journal of Systems Science and Complexity, 2003, 16(1): 101-103
Authors:CHEN Wei
Abstract:The transient behavior of a semiconductor device consists of a Poisson equation for the electric potential and of two nonlinear parabolic equations for the electron density and hole density. The electric potential equation is discretized by the finite element method. The electron and hole density equations are treated by implicit-explicit multistep finite element methods. The optimal L -norm error estimates are derived.
Keywords:Semiconductor device   strongly A(0)-stable   multistep methods   finite element methods.
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