| 亚微米级坡莫合金栅格研制 |
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| 引用本文： | 陈善宝.亚微米级坡莫合金栅格研制[J].华中科技大学学报(自然科学版),1987(5). |
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| 作者姓名： | 陈善宝 |
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| 作者单位： | 华中工学院固体电子学系 |
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| 摘 要： | 本文提出用激光干涉法制作亚微米级坡莫合金耦合栅格掩模,然后用FeCl_3溶液、等离子体两种刻蚀方法得到坡莫合金耦合栅格。文中对两种刻蚀方法进行了比较,讨论了得到高质量图形的工艺条件。
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| 关 键 词： | 坡莫合金 耦合栅格 激光干涉 掩模 刻蚀 光刻胶 亚微米级 |
Permalloy Grating of Submicron Size |
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| Chen Shanbao.Permalloy Grating of Submicron Size[J].JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE,1987(5). |
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| Authors: | Chen Shanbao |
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| Institution: | Chen Shanbao |
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| Abstract: | A mask made by holography for permalloy grating of submicron size is described. The grating pattern formed in photoresist can be transferred onto the permalloy with either the wet or plasma etching method. A comparison is made between the two methods and the technique for givinig high quality pattern is discussed. |
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| Keywords: | Permalloy Coupliing grating Interference of laser beams Mask Etching Photoresist Submicron size |
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