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新型微功耗集成漂洗发射极晶体管
引用本文:洪垣,刘炳国.新型微功耗集成漂洗发射极晶体管[J].应用科学学报,1988,6(2):117-122.
作者姓名:洪垣  刘炳国
作者单位:1. 上海科技专科学校;2. 华南工学院
摘    要:研制了磷穿过热生长薄氧化层扩散形成发射区的高频集成漂洗发射极晶体管.从与常规晶体管比较的角度,研究了这种新型的漂洗发射极晶体管的直流特性、电流增益与集电极电流及温度的关系、发射区禁带变窄效应和表面复合效应对增益的影响,并比较分析了两者的磷杂质纵向分布.

收稿时间:1986-09-02
修稿时间:1986-12-30

A NEW IC WASHED EMITTER TRANSISTOR WITH MICRO-POWER DISSIPATION
HONG YUAN,LIU BINGGUO.A NEW IC WASHED EMITTER TRANSISTOR WITH MICRO-POWER DISSIPATION[J].Journal of Applied Sciences,1988,6(2):117-122.
Authors:HONG YUAN  LIU BINGGUO
Institution:Shanghai University of Science and Technology, Branch
Abstract:A washed emitter transistor was developed, whose emitter was formed by phosphorus diffusion through a thin layer of thermally grown oxide. Studies were made on DC characteristics, current gain vs. collector current, and current gain vs. temperature. The effects of surface recombination and bandgap narrowing in the emitter on the gain were investigated. The results show that the washed emitter transistor has a uniform gain within the range of five orders of magnitude of IC and can work at a current as low as 1 nA. Compared with the conventional transistors, the minimum working current can be reduced by a factor of 103 and the surface recombination velocity by a factor of 50%, and an increased yield of 20% can be achieved. The gain is less temperature dependent because of lighter bandgap narrowing in the emitter. It can be expected that the power dissipation of ICs will be considerably reduced if the washed emitter transistor is adopted.
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