| 退火对大面积CdTe多晶薄膜薄膜的影响 |
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| 引用本文： | 王文武,雷智,郑家贵,冯良桓,邓懿,蔡亚萍,张静全,黎兵,武莉莉,李卫.退火对大面积CdTe多晶薄膜薄膜的影响[J].四川大学学报(自然科学版),2010,47(1):146-150. |
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| 作者姓名： | 王文武 雷智 郑家贵 冯良桓 邓懿 蔡亚萍 张静全 黎兵 武莉莉 李卫 |
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| 作者单位： | 四川大学材料科学与工程学院,成都,610064 |
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| 基金项目： | 863重点项目，高等学校博士学科点专项科研基金，四川省应用基础研究项目 |
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| 摘 要： | 对近空间升华法制备的大面积(30×40 cm~2)CdTe多晶薄膜用不同方法进行退火处理,用XRD、C～V、I～V等研究了退火条件,退火方式对薄膜结构和器件性能的影响.结果表明:刚沉积的CdTe多晶薄膜呈立方相,沿着(111)方向择优取,向而退火后(111)(220)(311)等峰都有不同程度的增加.在纯氧气氛下,400℃退火还出现了新峰.随着退火温度的增加,电导激活能降低.经过连续退火装置在400℃下退火30分钟的电池,1/C~2和V成线性关系,具有较高的掺杂浓度、较理想的二极管因子和较高的转换效率.
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| 关 键 词： | 大面积CdTe多晶薄膜 退火 |
The effect of large scale CdTe polycrystalline film of annealing |
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| WANG Wen-Wu,LEI Zhi,ZHENG Jia-Gui,FENG Liang-Huang,DENG Yi,CAI Ya-Ping,ZHANG Jing-Quan,LI Bing,WU Li-Li,LI Wei.The effect of large scale CdTe polycrystalline film of annealing[J].Journal of Sichuan University (Natural Science Edition),2010,47(1):146-150. |
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| Authors: | WANG Wen-Wu LEI Zhi ZHENG Jia-Gui FENG Liang-Huang DENG Yi CAI Ya-Ping ZHANG Jing-Quan LI Bing WU Li-Li LI Wei |
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| Institution: | College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University;College of Material Science and Engineering, Sichuan University |
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| Abstract: | Large CdTe thin films prepared by close-spaced-sublimation (CSS) technique were an-nealed. The effect of films' structure and properties by annealing was studied by XRD, C～V,I～V.The results showed that the structure of as-deposited CdTe film was cube and that (111)(220)(311)peaks increased after annealed. There appeared new peak in the sample annealed at 400 ℃ in oxygen.And with the temperature increasing, the activation energy decreased. The results of C～V and I～Vcharacteristics improve that the continuous annealing apparatus and ultrasonic spraying CdCl_2 solution fashion is suitable for manufacture. |
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| Keywords: | large scale CdTe polycrystalline film anneal |
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