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退火温度对FePt薄膜物性的影响
引用本文:吴佺,许佳玲,贾利云,孙会元.退火温度对FePt薄膜物性的影响[J].河北师范大学学报(自然科学版),2012,36(2):144-146,171.
作者姓名:吴佺  许佳玲  贾利云  孙会元
作者单位:1. 河北建筑工程学院数理系,河北张家口,075024
2. 河北师范大学物理科学与信息工程学院,河北石家庄050024;河北省新型薄膜材料省重点实验室,河北石家庄050024
基金项目:国家自然科学基金(10274018);河北省科技厅科技攻关计划(07215105);张家口市科学技术研究与发展指导计划(0921036B)
摘    要:用直流磁控溅射方法和原位退火工艺在玻璃基片上制备了Fe48Pt52纳米薄膜.研究发现,退火温度对FePt膜的微结构和磁特性有很大的影响,退火可以减小颗粒间的磁相互作用,矫顽力随退火温度的升高先急剧增大后减小,600℃退火处理的FePt样品平行膜面方向的矫顽力略大于垂直方向,分别达到了684.4,580.9 kA/m;650℃退火处理的FePt样品在2个方向上都获得了巨大的矫顽力,最大值达到了986.8 kA/m.

关 键 词:磁记录  FePt  退火温度  矫顽力

Influence of Annealing Temperature on Microstructure and Magnetic Properties of FePt Films
WU Quan , XU Jialing , JIA Liyun , SUN Huiyuan.Influence of Annealing Temperature on Microstructure and Magnetic Properties of FePt Films[J].Journal of Hebei Normal University,2012,36(2):144-146,171.
Authors:WU Quan  XU Jialing  JIA Liyun  SUN Huiyuan
Institution:2,3(1.Department of Mathematics and Physics,Hebei Architecture and Civil Engineering College,Hebei Zhangjiakou 075024,China;2.College of Physics Science and Information Engineering,Hebei Normal University,Hebei Shijiazhuang 050024,China;3.Hebei Advanced Thin Films Laboratory,Hebei Shijiazhuang 050024,China)
Abstract:Fe48Pt52 films were fabricated onto glass amorphous substrates using a dc facing-target magnetron sputtering system and annealed at temperature ranging from 500 to 700 ℃.The studies show that the microstructure and magnetic properties of FePt films are greatly affected by the annealing temperature.With increasing the annealing temperature,the coercivity sharply increases and then decreases.In the FePt film annealed at 600 ℃,the in-plane coercivity is bigger than the out of plane coercivity,partly 684.4,580.9 kA/m are obtained.At 650 ℃,the huge coercivity reaches 986.8 kA/m.
Keywords:magnetic recording  FePt  annealing temperature  coercivity
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