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亚90nm沟道MOSFET亚阈值状态下二维电势和阈值电压的半解析模型
引用本文:盂坚,柯导明,韩名君.亚90nm沟道MOSFET亚阈值状态下二维电势和阈值电压的半解析模型[J].中国科学:信息科学,2013(11):1496-1510.
作者姓名:盂坚  柯导明  韩名君
作者单位:安徽大学电子信息工程学院,合肥230601
基金项目:国家自然科学基金(批准号:61076086)和高等学校博士学科点专项科研基金(批准号:20103401110008)资助项目
摘    要:本文提出一个亚90nm沟道MOSFET在亚阈值状态下的二维电势和阈值电压的半解析模型.文章首先根据短沟道MOSFET在亚闽值状态下的物理模型提出定解问题,然后用特征函数将由氧化层和空间电荷区衔接条件所得到的超越方程组作正交展开,得到关于未知量的线性代数方程组.求出了氧化层和空间电荷区的二维电势、耗尽层厚度和阈值电压的表达式.该模型不需要适配参数,运算量小,避免了方程离散化,计算精度与数值解精度相同.文章给出了沟道长度为90nm以下MOSFET的电势分布、表面势、耗尽层厚度和阈值电压计算结果.计算值与二维数值模拟值高度吻合.

关 键 词:亚90  nm沟道MOSFET  二维电势分布  耗尽层厚度  阈值电压  半解析模型

A 2-D semi-analytical model for electric potential and threshold voltage of the sub-90 nm channel MOSFET in subthreshold state
MENG Jian,KE DaoMing & HAN MingJun.A 2-D semi-analytical model for electric potential and threshold voltage of the sub-90 nm channel MOSFET in subthreshold state[J].Scientia Sinica Techologica,2013(11):1496-1510.
Authors:MENG Jian  KE DaoMing & HAN MingJun
Institution:School of Electrons and Information Engineering, Anhui University, Hefei 230601, China
Abstract:A A 2D semi-analytical model for electric potential and threshold voltage of the sub-90 nm channel MOSFET in subthreshold state is presented in this paper. First, a definite problem is given according to the physical model of the Short Channel MOSFET in sub-threshold state, and then the transcendental equations obtained by using the connected condition of oxide layer and space charge region are expanded by the charac- teristic function. The results are linear algebraic equations about unknown quantities. The 2D electric potential expressions of oxide layer and space charge region, depletion thickness and threshold voltage are obtained by the model. The model is free of adapter parameters, its calculation amount is small, the equation discretion is avoided and the result is as accurate as the numerical solution. The potential distribution, surface potential, depletion thickness and threshold of the MOSFET whose channel length is shorter than 90 nm have been calculated in this paper. It is shown that the calculated results are highly coincident with the 2D numerical simulations.
Keywords:sub-90 nm channel MOSFET  2-D potential distribution  depletion layer thickness  threshold voltage  semi-analytical model
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