| 测定金属-半导体接触电阻的一种方法 |
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| 引用本文： | 武蕴忠,孙承龙.测定金属-半导体接触电阻的一种方法[J].应用科学学报,1985,3(2):155-160. |
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| 作者姓名： | 武蕴忠 孙承龙 |
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| 作者单位： | 中国科学院上海冶金研究所 |
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| 摘 要： | 根据环形电极点辐射传输线模型,导出金属-半导体接触电阻对扩展电阻、探针与金属薄膜之间的接触电阻、电压和电流的定量关系.设计出一个用四探针方法测定金属-半导体接触电阻的新方案.精确测定了金属-半导体的接触电阻.讨论了金属-半导体接触电阻测量值的误差来源.
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| 收稿时间： | 1982-09-01 |
| 修稿时间： | 1983-01-21 |
A MEASUREMENT METHOD OF METAL-SEMICONDUCTOR CONTACT RESISTANCE |
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| WU YUNZHONG,SUN CHENGLONG.A MEASUREMENT METHOD OF METAL-SEMICONDUCTOR CONTACT RESISTANCE[J].Journal of Applied Sciences,1985,3(2):155-160. |
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| Authors: | WU YUNZHONG SUN CHENGLONG |
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| Institution: | Shanghai Institute of Metallurgy, Academia Sinica |
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| Abstract: | The influence of spreading resistance and probe-metal film contact resistance on the contact resistance of metal-semiconductor is generally neglected in the conventional methods used for measuring metal-semiconductor contact risistance. Thus errors would be caused when one uses these methods to measure the metal-semi conductor contact resistance.In this paper, according to the radial transmission line mode of circular ring electrode, an equation bearing the quantitative relationship between metal-semiconductor contact resistance and spreading resistance of thin film, probe-thin metal film contact resistance, current and voltage is derived. Based upon the equation, a new mode for measurement of metal-semiconductor contact resistance using four-point probe method is proposed. The metal-semiconductor contact resistance is accurately measured and the error sources from this measurement are discussed. |
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