沉积温度对TiN/SiN_x多层膜结构及力学性能的影响

采用反应磁控溅射方法,在不同沉积温度条件下制备了一系列多晶TiN/SiNx纳米多层膜,并用X射线衍射仪（XRD）、X射线反射仪（XRR）及纳米压痕仪（Nanoindenter）表征了材料的微观结构及力学性能。结果表明,沉积温度对多层膜的界面结构、择优取向及力学性能有显著影响：当沉积温度为室温时,多层膜的界面较高温条件下粗糙;而多层膜的择优取向在沉积温度为400℃时呈现强烈的TiN（200）织构;多层膜的硬度及弹性模量在室温至400℃温度范围内变化不大。

Influences of deposition temperature on the TiN/SiN_x multilayer films structure and mechanical properties

The polycrystalline TiN/SiNx nano-multilayer films are deposited by using reactive magnetron sputtering at different temperatures,and their microstructures and mechanical properties are characterized with X-ray reflectivity（XRR）,X-ray diffraction（XRD） and Nanoindenter.The results show that the deposition temperatures have significant influences on the interface structures,preferred orientation and mechanical properties of multilayer films.When the deposition temperature is room temperature,the interfaces of multilayers are rougher than other samples deposited at higher temperatures.The preferred orientation of TiN（200） is the strongest when the deposition temperature is 400℃.The hardness and modulus of the multilayers vary a little when deposited between room temperature and 400℃.