Broadband antireflection coatings deposited by magnetron sputtering |
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Authors: | Mingli Wang Hui Gong Zhengxiu Fan |
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Institution: | (1) Optical Coating Center, Shanghai Institute of Optic and Fine Machine, Chinese Academy of Sciences, 201800 Shanghai, China |
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Abstract: | Conclusions
1) |
Using conventional deposition techniques of heating or e-beam evaporation, the effect of the substrate’s temperature cannot
be neglected. If the substrate temperature is not uniform, the uniformity of the film thickness and the film’s composition
may change. But with magnetron sputtering deposition, the effect of the substrate temperature is almost absent.
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2) |
It is known that various of evaporation depositions, such as ion sputtering deposition and other physical vapor depositions
can hardly be used to prepare large-area uniform films. At present, magnetron sputtering deposition is the best preparation
method of large-area uniform films.
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3) |
With the quartz crystal monitor of film thickness and suitably designed film structures, films of less than 0.2% reflectivity
in visible region can be obtained.
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Keywords: | magnetron sputtering broadband antireflection deposition |
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