| 退火温度对溅射氧化锌薄膜的影响 |
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| 引用本文： | 徐芸芸,张韬,李争鸣. 退火温度对溅射氧化锌薄膜的影响[J]. 科技导报(北京), 2009, 27(15): 80-82 |
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| 作者姓名： | 徐芸芸 张韬 李争鸣 |
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| 作者单位： | 徐州空军学院,江苏,徐州,221008;徐州空军学院,江苏,徐州,221008;徐州空军学院,江苏,徐州,221008 |
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| 摘 要： | 利用射频磁控溅射技术在玻璃基片上制备了高度C轴择优取向的纳米氧化锌(ZnO)薄膜,采用扫描电子显微镜和X射线衍射仪研究了退火热处理温度对ZnO薄膜形貌、结构和内应力的影响规律.结果表明:热处理可以明显改善薄膜的结晶质量,薄膜的晶粒变得致密,尺寸也变得均匀;(002)衍射面的晶面间距和内应力均低于未经热处理的样品;当温度高于450℃以后,薄膜的致密度反而下降,部分晶粒异常长大,随着退火温度的逐渐升高,ZnO薄膜(002)衍射面的晶面间距和内应力先减小,到450℃达到最小值,后又逐渐增大,可见450℃热处理后,薄膜的表面形貌、结构和内应力均得到很大的改善.
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| 关 键 词： | ZnO薄膜 扫描电子显微镜 X射线衍射 退火热处理 |
Effect of Annealing Temperature on Sputtered ZnO Thin Film |
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| XU Yunyun,ZHANG Tao,LI Zhengming Xuzhou Air Force College,Xuzhou ,Jiangsu Province,China. Effect of Annealing Temperature on Sputtered ZnO Thin Film[J]. Science & Technology Review, 2009, 27(15): 80-82 |
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| Authors: | XU Yunyun ZHANG Tao LI Zhengming Xuzhou Air Force College Xuzhou Jiangsu Province China |
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| Affiliation: | XU Yunyun,ZHANG Tao,LI Zhengming Xuzhou Air Force College,Xuzhou 221008,Jiangsu Province,China |
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| Abstract: | Highly C-axis oriented nano-ZnO thin film was manufactured by RF-magnetron sputtering technique on a normal glass base.The influence of the heat treatment temperature on the ZnO thin film's morphology,microstructure and the residual stress is studied by the Scanning Electron Microscope and X-ray diffraction apparatuses.During the sputtering process,due to various factors,there may be residual stresses in thin films,which are usually to be reduced by heat treatment.It is shown that the films' quality can be ... |
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| Keywords: | ZnO thin film Scanning Electron Microscope X-ray diffraction heat treatment |
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