| 阴极真空电弧沉积MgO薄膜的椭偏光谱研究 |
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| 引用本文： | 刘毅,林晓东,朱道云,陈弟虎,何振辉. 阴极真空电弧沉积MgO薄膜的椭偏光谱研究[J]. 中山大学学报(自然科学版), 2007, 46(1): 26-30 |
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| 作者姓名： | 刘毅 林晓东 朱道云 陈弟虎 何振辉 |
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| 作者单位： | 深圳大学物理科学学院，深圳大学物理科学学院，中山大学物理科学与工程技术学院∥光电材料与技术国家重点实验室，中山大学物理科学与工程技术学院∥光电材料与技术国家重点实验室，中山大学物理科学与工程技术学院∥光电材料与技术国家重点实验室 广东深圳518060，中山大学物理科学与工程技术学院∥光电材料与技术国家重点实验室，广东广州510275，广东深圳518060，广东广州510275，广东广州510275，广东广州510275 |
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| 基金项目： | 国家高技术研究发展计划(863计划);深圳大学校科研和教改项目 |
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| 摘 要： | 采用阴极真空电弧离子沉积技术在硅基片上制备出了MgO薄膜。利用椭圆偏振光谱、原子力显微镜及扫描电子显微镜分别对不同氧流量下制备的MgO薄膜的厚度,光学常数,表面粗糙度及表面形貌进行了分析,并对椭圆偏振光谱的光学粗糙度结果和原子力显微镜的均方根粗糙度结果进行了对比和分析。结果表明,不同氧流量下制备出的MgO薄膜,表面粗糙度及薄膜颗粒随着氧流量的增加而增大。椭偏光谱与AFM得到的表面粗糙度存在线性一致关系,表明椭偏光谱可作为一种很好的无损分析手段。
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| 关 键 词： | 阴极真空电弧离子沉积 MgO薄膜 椭圆偏振光谱 表面粗糙度 |
| 文章编号： | 0529-6579（2007）01-0026-05 |
| 修稿时间： | 2006-05-20 |
Spectroscopic Ellipsometric Study of MgO Thin Films Deposited by Cathodic Vacuum arc Deposition (CVAD) |
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| LIU Yi,LIN Xiao-dong,ZHU Dao-yun,CHEN Di-hu,HE Zhen-hui. Spectroscopic Ellipsometric Study of MgO Thin Films Deposited by Cathodic Vacuum arc Deposition (CVAD)[J]. Acta Scientiarum Naturalium Universitatis Sunyatseni, 2007, 46(1): 26-30 |
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| Authors: | LIU Yi LIN Xiao-dong ZHU Dao-yun CHEN Di-hu HE Zhen-hui |
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| Affiliation: | 1. College of Physics, Shenzhen University, Shenzhen 518060, China; 2. State Key Laboratory of Optoelectronic Materials and Technologies//School of Science and technologies, Sun Yet-sen University, Guangzhou 510275, China |
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| Abstract: | MgO thin films deposited on Si(100) were prepared by cathodic vacuum arc deposition(CVAD) at different oxygen flow rates.Spectroscopic ellipsometry(SE),scanning electron microscopy(SEM) and atomic force microscopy(AFM) were performed to study the MgO thin films.The optical constants and optical roughness of these samples were obtained by modeling and calculating from SE.Results show that the optical roughness increases with increasing oxygen flow rate,which is in accordance with the results of SEM and AFM.A linear relationship was obtained by comparing the optical roughness and mean square roughness by AFM,which suggests that SE is an effective method to evaluate thin film surfaces. |
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| Keywords: | CVAD MgO thin films spectroscopic ellipsometry surface roughness |
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